High-aspect-ratio structure fabrication on (110)-oriented silicon surfaces using tribo-nanolithography.

This study investigated methods of fabricating high-aspect-ratio structures on a silicon surface using a combination of tribo-nanolithography and wet chemical etching. Tribo-nanolithography forms an amorphous phase on a single-crystal silicon surface that has an etch resistance against potassium hydroxide so that a protruding structure can be fabricated by wet chemical etching. To fabricate high-aspect-ratio structures, (110)-oriented silicon was used, and the effect of machining parameters on the structure shape was investigated.