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Oxidation behaviour of Ti2AIN films composed mainly of nanolaminated MAX phase.
J Nanosci Nanotechnol
October 2011
Chair of Physical Metallurgy and Materials Technology, Technical University of Brandenburg at Cottbus, Konrad-Wachsmann-Allee 17, 03046 Cottbus, Germany.
In this paper, we reported the oxidation behaviour of Ti2AIN films on polycrystalline Al2O3 substrates. The Ti2AIN films composed mainly of nanolaminated MAX phase was obtained by first depositing Ti-Al-N films using reactive sputtering of two elemental Ti and Al targets in Ar/N2 atmosphere and subsequent vacuum annealing at 800 degrees C for 1 h. The Ti2AIN films exhibited excellent oxidation resistance and thermal stability at 600-900 degrees C in air.
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