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Reactive species generated during wet chemical etching of silicon in HF/HNO3 mixtures.
J Phys Chem B
June 2006
Leibniz Institute for Solid State and Material Research Dresden (IFW Dresden), P.O. Box 270116, D-01171 Dresden, Germany.
The role of intermediate species generated during wet chemical etching of silicon in a HF-rich HF/HNO3 mixture was studied by spectroscopic and analytical methods at 1 degrees C. The intermediate N2O3 was identified by its cobalt blue color and the characteristic features in its UV-vis and Raman spectra. Furthermore, a complex N(III) species (3NO+.
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