Surface etching and edge control of hexagonal boron nitride assisted by triangular Sn nanoplates.

Hexagonal boron nitride (hBN) is an ideal insulating substrate and template for other two-dimensional (2D) materials. The combination of hBN and 2D materials of group IV atoms, such as graphene, is interesting, because it can offer attractive physical properties and promising applications. Here, we demonstrate the unique behavior of tin (Sn), one of the group IV elements, on multilayer hBN which was grown by chemical vapor deposition (CVD).

Two-step synthesis and characterization of vertically stacked SnS-WS and SnS-MoS p-n heterojunctions.

We demonstrate the synthesis of unique heterostructures consisting of SnS and WS (or SnS and MoS) by two-step chemical vapor deposition (CVD). After the first CVD growth of triangular WS (MoS) grains, the second CVD step was performed to grow square SnS grains on the same substrate. We found that these SnS grains can be grown at very low temperature with the substrate temperature of 200 °C.

Epitaxial chemical vapour deposition growth of monolayer hexagonal boron nitride on a Cu(111)/sapphire substrate.

Hexagonal boron nitride (h-BN), an atomically thin insulating material, shows a large band gap, mechanical flexibility, and optical transparency. It can be stacked with other two-dimensional (2D) materials through van der Waals interactions to form layered heterostructures. These properties promise its application as an insulating layer of novel 2D electronic devices due to its atomically smooth surface with a large band gap.