Enhanced optical absorption in conformally grown MoS layers on SiO/Si substrates with SiO nanopillars with a height of 50 nm.

The integration of transition metal dichalcogenide (TMDC) layers on nanostructures has attracted growing attention as a means to improve the physical properties of the ultrathin TMDC materials. In this work, the influence of SiO nanopillars (NPs) with a height of 50 nm on the optical characteristics of MoS layers is investigated. Using a metal organic chemical vapor deposition technique, a few layers of MoS were conformally grown on the NP-patterned SiO/Si substrates without notable strain.