5 results match your criteria: "Domaine Universitaire de Saint-Jérôme Institut Fresnel UMR CNRS 6133[Affiliation]"

Multiscale analysis of the laser-induced damage threshold in optical coatings.

Appl Opt

October 2008

Institut Fresnel (UMR CNRS 6133), Université Aix Marseille, Ecole Centrale Marseille, Domaine Universitaire de St Jérôme, 13397 Marseille Cedex 20, France.

We have investigated the influence of laser beam size on laser-induced damage threshold (LIDT) in the case of single- and multiple-shot irradiation. The study was performed on hafnia thin films deposited with various technologies (evaporation, sputtering, with or without ion assistance). LIDT measurements were carried out at 1064 nm and 12 ns with a spot size ranging from a few tens to a few hundreds of micrometers, in 1-on-1 and R-on-1 modes.

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A comparative study is made of the laser damage resistance of hafnia coatings deposited on fused silica substrates with different technologies: electron beam deposition (from Hf or HfO(2) starting material), reactive low voltage ion plating, and dual ion beam sputtering. The laser damage thresholds of these coatings are determined at 1064 and 355 nm using a nanosecond pulsed YAG laser and a one-on-one test procedure. The results are associated with a complete characterization of the samples: refractive index n measured by spectrophotometry, extinction coefficient k measured by photothermal deflection, and roughness measured by atomic force microscopy.

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Localized measurement of the optical thickness of a transparent window: application to the study of the photosensitivity of organic polymers.

Appl Opt

August 2006

Institut FRESNEL-UMR CNRS 6133, Université Paul Cézanne, EGIM, Université de Provence, Domaine Universitaire de Saint-Jérôme, 13397 Marseille Cedex 20, France.

The development of an optical setup that permits us to carry out high-resolution mappings of the absolute optical thickness of plane-parallel transparent windows is described. This measurement is based on the recording and processing of the spectral transmission of the wafer between 1,520 and 1,570 nm and has a relative precision better than 10(-6). Hence it is used for the characterization of the photosensitivity of two organic photopolymers (cationic ring opening polymer and poly(methylmethacrylate)).

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We present the characterizations performed at the Institut Fresnel for the Measurement Problem of the Optical Interference Coatings 2004 Topical Meeting. A single layer coated on a fused-silica substrate of unknown composition and parameters is analyzed in terms of optogeometrical parameters, uniformity, and scattering. We determine the refractive index and the average thickness of the coating, then provide the localized determination of the thickness with a 2 mm spatial resolution.

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