Photocatalytic deposition of noble metals on 0D, 1D, and 2D TiO structures: a review.

In recent years, extensive research on noble metal-TiO nanocomposites has demonstrated their crucial role in various applications such as water splitting, self-cleaning, CO reduction, and wastewater treatment. The structure of the noble metal-TiO nanocomposites is critical in determining their photocatalytic properties. Numerous studies in the literature describe the preparation of these nanocomposites with various shapes and sizes to achieve tunable photocatalytic performance.

Multielectrode Arrays at Wafer-Level for Miniaturized Sensors Applications: Electrochemical Growth of Ag/AgCl Reference Electrodes.

In this study, a range of miniaturized Ag/AgCl reference electrodes with various layouts were successfully fabricated on wafer-level silicon-based substrates with metallic intermediate layers by precisely controlling the electrochemical deposition of Ag, followed by electrochemical chlorination of the deposited Ag layer. The structure, as well as the chemical composition of the electrode, were characterized with SEM & EDS. The results showed that the chlorination is very sensitive to the applied electric field and background solution.

Three-Dimensional Metal-Insulator-Metal Decoupling Capacitors with Optimized ZrO ALD Properties for Improved Electrical and Reliability Parameters.

Embedded three-dimensional (3-D) metal-insulator-metal (MIM) decoupling capacitors with high-κ dielectric films of high capacitance and long-life time are increasingly needed on integrated chips. Towards achieving better electrical performance, there is a need for investigation into the influence of the variation in atomic layer deposition (ALD) parameters used for thin high-κ dielectric films (10 nm) made of AlO-doped ZrO. This variation should always be related to the structural uniformity, the electrical characteristics, and the electrical reliability of the capacitors.

Structural and Electrical Response of Emerging Memories Exposed to Heavy Ion Radiation.

Hafnium oxide- and GeSbTe-based functional layers are promising candidates in material systems for emerging memory technologies. They are also discussed as contenders for radiation-harsh environment applications. Testing the resilience against ion radiation is of high importance to identify materials that are feasible for future applications of emerging memory technologies like oxide-based, ferroelectric, and phase-change random-access memory.

Surface-Dependent Performance of Ultrathin TiN Films as an Electrically Conducting Li Diffusion Barrier for Li-Ion-Based Devices.

An in-depth understanding of lithium (Li) diffusion barriers is a crucial factor for enabling Li-ion-based devices such as three-dimensional (3D) thin-film batteries and synaptic redox transistors integrated on silicon substrates. Diffusion of Li ions into silicon can damage the surrounding components, detach the device itself, lead to battery capacity loss, and cause an uncontrolled change of the transistor channel conductance. In this study, we analyze for the first time ultrathin 10 nm titanium nitride (TiN) films as a bifunctional Li-ion diffusion barrier and current collector.

Morphology-Driven Control of Metabolite Selectivity Using Nanostructure-Initiator Mass Spectrometry.

Nanostructure-initiator mass spectrometry (NIMS) is a laser desorption/ionization analysis technique based on the vaporization of a nanostructure-trapped liquid "initiator" phase. Here we report an intriguing relationship between NIMS surface morphology and analyte selectivity. Scanning electron microscopy and spectroscopic ellipsometry were used to characterize the surface morphologies of a series of NIMS substrates generated by anodic electrochemical etching.