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Self-absorption effect in soft X-ray emission spectra utilized for bandgap evaluation of semiconductors.

Microscopy (Oxf)

January 2025

Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai, Miyagi 980-8577, Japan.

The self-absorption effects observed in the background intensity just above the Si L-emission spectra of Si and β-Si3N4, and the C K-emission spectra of diamond and graphite were examined. Based on comparisons with reported results, the energy positions of absorption edges-representing the bottom of conduction bands (CB)-were assigned. The self-absorption profiles in the background intensities were consistent with previously reported data.

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To understand the electronic-structure change of LiCoO, a widely used cathode material in Li-ion batteries, during charge-discharge, we performed soft X-ray absorption spectroscopy (XAS) and resonant soft X-ray emission spectroscopy (RXES) of the Co L edge in combination with charge-transfer multiplet calculations. The RXES profile significantly changed for the charged state at 4.2 V Li/Li, corresponding to the oxidation reaction from a Co low-spin state for the initial state, while the XAS profile exhibited small changes.

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Understanding the confinement of fast ions is crucial for plasma heating and non-inductive current drive, i.e., for the operation of a fusion reactor.

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X-ray free-electron lasers (FELs) are modern research tools with applications in multiple scientific fields. Standard x-ray FEL pulses are produced by the self-amplified spontaneous emission (SASE) mechanism. SASE-FEL pulses have high power, short duration, and excellent transverse coherence but exhibit poor temporal coherence with power and spectral profiles consisting of multiple randomly distributed spikes.

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Thermal Conversion of Ultrathin Nickel Hydroxide for Wide Band Gap 2D Nickel Oxides.

ACS Omega

November 2024

Division of Materials Science and Engineering, Boston University, 15 St. Mary's Street, Boston, Massachusetts 02215, United States.

Wide band gap (WBG) semiconductors ( > 2.0 eV) are integral to the advancement of next-generation electronics, optoelectronics, and power industries owing to their capability for high-temperature operation, high breakdown voltage, and efficient light emission. Enhanced power efficiency and functional performance can be attained through miniaturization, specifically via the integration of device fabrication into a two-dimensional (2D) structure enabled by WBG 2D semiconductors.

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