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Black fungi on rock surfaces endure a spectrum of abiotic stresses, including UV radiation. Their ability to tolerate extreme conditions is attributed to the convergent evolution of adaptive traits, primarily highly melanized cell walls. However, studies on fungal melanins have not provided univocal results on their photoprotective functions.

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Recovery of insect-pathogenic fungi from solar UV damage: Molecular mechanisms and prospects.

Adv Appl Microbiol

October 2024

Institute of Microbiology, College of Life Sciences, Zhejiang University, Hangzhou, P.R. China. Electronic address:

Article Synopsis
  • The chapter discusses how insect-pathogenic fungi develop tolerance to solar UV damage and outlines methods to measure their responses to UV radiation, focusing on UVB and UVA exposure throughout sunny summer days.
  • It highlights the comparison of anti-UV mechanisms in these fungi with those documented in model yeast, particularly emphasizing the importance of timing when applying fungal pesticides for better pest control.
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Removal of antibiotic resistant bacteria and antibiotic resistance genes by an electrochemically driven UV/chlorine process for decentralized water treatment.

Water Res

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School of Environment, Beijing Key Laboratory for Emerging Organic Contaminants Control, State Key Joint Laboratory of Environmental Simulation and Pollution Control, Tsinghua University, Beijing 100084, China. Electronic address:

The UV/chlorine (UV/Cl) process is a developing advanced oxidation process and can efficiently remove antibiotic resistant bacteria (ARB) and antibiotic resistance genes (ARGs). However, the transportation and storage of chlorine solutions limit the application of the UV/Cl process, especially for decentralized water treatment. To overcome the limitation, an electrochemically driven UV/Cl process (E-UV/Cl) where Cl can be electrochemically produced in situ from anodic oxidation of chloride (Cl) ubiquitously present in various water matrices was evaluated in this study.

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Background: 6 - 4 photoproducts are the second most common UV-induced DNA lesions after cyclobutane pyrimidine dimers. In plants, they are mainly repaired by photolyases in a process called photoreactivation. While pyrimidine dimers can be deleterious, leading to mutagenesis or even cell death, 6 - 4 photoproducts can activate specific signaling pathways.

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In budding yeast, Rad5 and Rad7-Rad16 play respective roles in the error-free post-replication repair and nucleotide excision repair of ultraviolet-induced DNA damage; however, their homologs have not yet been studied in non-yeast fungi. In the fungus , a deficiency in the Rad7 homolog, Rad5 ortholog and two Rad16 paralogs (Rad16A/B) instituted an ability to help the insect-pathogenic fungus to recover from solar UVB damage through photoreactivation. The fungal lifecycle-related phenotypes were not altered in the absence of , or while severe defects in growth and conidiation were caused by the double deletion of and .

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