Mucin type O-glycan core elongation is typically performed by the C1GALT1, B3GNT6, and ST6GalNAc-I/-II O-glycosyltransferases. These enzymes target the Tn antigen (GalNAc-O-Thr/Ser) dictating the fate of O-glycan elongation, playing important roles in health and disease. Changes in transferase expression and glycan structure are commonly associated with diseases such as cancer, Tn-syndrome, and ulcerative colitis. Despite their significance, their substrate specificities and their biological roles remain elusive. Here, we examine the roles of flanking glycopeptide substrate charge using a library of differently charged glycopeptides and a small library of PSGL-1 Thr57 based charged glycopeptides. We found that C1GALT1 was most influenced by flanking charge preferring negatively charged substrates, while B3GNT6 and ST6GalNAc-II were less influenced, showing unique N- and C-terminal charge preferences. Interestingly, ST6GalNAc-I was not influenced by flanking charge. These charge specificities were further maintained against the charged PSGL-1 glycopeptides, although ST6GalNAc-I showed an increased preference towards a remote N-terminal positive charge. The observed charge preferences were to a large part driven by substrate interactions with the electrostatic surface of the transferase. We propose that negative flanking charge may assist C1GALT1 in targeting key glycosites such as in PSGL-1 and podoplanin. Our findings are consistent with a Golgi hierarchy, where the cis-Golgi localized GalNAc-Ts and C1GALT1 determine the site and thus fate of glycosylation, while the trans-Golgi less-specific ST6GalNAc-I provides a final capping function. This characterization of substrate charge preference furthers our understanding of how these enzymes select their substrates and may contribute to our understanding of their biological roles.
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http://dx.doi.org/10.1093/glycob/cwaf014 | DOI Listing |
Anal Chim Acta
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Department of Nephrology, The First Affiliated Hospital of Ningbo University, Ningbo, 315010, Zhejiang, PR China. Electronic address:
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Institutes of Physical Science and Information Technology, Anhui University, Hefei 230601, China.
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Jiangxi Province Key Laboratory of Light Alloy, School of Advanced Manufacturing, Nanchang University, Nanchang 330031, P.R. China.
Herein, a superhydrophobic surface was designed and fabricated based on the "lotus effect" construction mechanism. The zeolitic imidazolate framework (ZIF-90) micro-nanoparticles were initially synthesized via a one-pot method, combined with long-chain stearic acid (STA), and subsequently embedded in polyvinyl butyral (PVB) to form a superhydrophobic surface at room temperature. The superhydrophobic surface demonstrated mechanical stability and retained its superhydrophobicity with a water contact angle (CA) greater than 150°, even at a wear distance of 400 cm.
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March 2025
Department of Chemistry, School of Sciences, Christ University Bengaluru 560029 Karnataka India
The ongoing discharge of hazardous dyes from industrial processes has intensified global water pollution, posing serious threats to aquatic ecosystems and human health. Addressing this challenge, our study explores the potential of bio-based carbon nanomaterials (CNM), synthesized from onion peel biowaste and designated as ON11, as effective agents in dye removal. These CNMs were incorporated into a mixed matrix membrane (MMM), using polysulfone (PSU) as the membrane substrate, to enhance dye adsorption.
View Article and Find Full Text PDFNanoscale
March 2025
The Russell Berrie Nanotechnology Institute, Technion-Israel Institute of Technology, Haifa 3200003, Israel.
The growth of ultrathin layers of oxides by atomic layer deposition (ALD) is well documented for oxide substrates such as SiO, BiO, AlO, in which oxygen is the only negatively charged atom. In contrast, the knowledge regarding ALD growth on substrates containing other negatively charged atoms, such as halogens, is quite limited. The commonly used bismuth oxyhalide (BiOX) family of materials are characterised by a low density of surface hydroxyls, required for the initiation of thermal ALD growth of oxides, thus hampering the ability to grow ultrathin layers of oxides on their surface.
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