This paper presents an advanced exposure system that, we believe, for the first time, enables annular lithography to create micro- and mesostructures on curved surfaces. The principle of ring creation is based on an axicon zoom system whereas the exposure tool exhibits several features that enhance its performance over previous models. Its optical design features a high numerical aperture, resulting in narrow ring widths and high resolution. Additionally, the ring diameter, which can be varied between 400 µm and 8 mm, remains constant along the optical axis due to telecentric imaging. Further functional components include an observation unit for alignment and monitoring, as well as an integrated autofocus system. In addition to determining the exposure ring width (∼ 10 µm), diffractive lenses on planar substrates as well as on a spherical lens with a radius of curvature of 68.8 mm were structured. The periods of the diffractive structure varied between 60 µm and 460 µm.
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This paper presents an advanced exposure system that, we believe, for the first time, enables annular lithography to create micro- and mesostructures on curved surfaces. The principle of ring creation is based on an axicon zoom system whereas the exposure tool exhibits several features that enhance its performance over previous models. Its optical design features a high numerical aperture, resulting in narrow ring widths and high resolution.
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Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, People's Republic of China.
Electron beam lithography is a critical technology for achieving high-precision nanoscale patterning. The presence of resist residues in the structures can significantly affect subsequent processes such as etching and lift-off. However, the evaluation and optimization of resist residues currently relies on qualitative observations like scanning electron microscopy (SEM), necessitating multiple experiments to iteratively optimize exposure parameters, which is not only labor-intensive but also costly.
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Applicable surface-enhanced Raman scattering (SERS) active substrates typically require low-cost patterning methodology, high reproducibility, and a high enhancement factor (EF) over a large area. However, the lack of reproducible, reliable fabrication for large area SERS substrates in a low-cost manner remains a challenge. Here, a patterning method based on nanosphere lithography and adhesion lithography is reported that allows massively parallel fabrication of 10-nm annular gap arrays on large areas.
View Article and Find Full Text PDFIn this paper, soft-edge toroidal amplitude filter (STAF) and soft-edge toroidal complex amplitude filter (STCAF) are designed according to the principle that soft-edge structures can eliminate diffraction. Based on the Mach-Zehnder interference principle, a double optical path compound interference modulation method that can generate soft annular beams is proposed by using STAF and STCAF. The 1/e radius and peak-to-average ratio (PAR) were used to evaluate the ring width and uniformity of the annular beam.
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