Anti-ambipolar transistors (AAT) are considered as a breakthrough technology in the field of electronics and optoelectronics, which is not only widely used in diverse logic circuits, but also crucial for the realization of high-performance photodetectors. The anti-ambipolar characteristics arising from the gate-tunable energy band structure can produce high-performance photodetection at different gate voltages. As a result, this places higher demands on the parametric driving range (ΔVg) and peak-to-valley ratio (PVR) of the AAT. Here, we demonstrate a high-performance photodetector with anti-ambipolar properties based on a van der Waals heterojunction of MoTe2/MoS2. Flexible modulation of carrier concentration and transport by gate voltage achieves a driving voltage range ΔVg as high as 38.4 V and a peak-to-valley ratio PVR of 1.6 × 102. Most importantly, MoTe2/MoS2 exhibits a pronounced gate-tunable photoresponse, which is attributed to the modulation of photogenerated carrier transport by gate voltage. The MoTe2/MoS2 heterojunction photodetector exhibits excellent performance, including an impressive responsivity of 17 A/W, a high detectivity of 4.2 × 1011 cm Hz1/2 W-1, an elevated external quantum efficiency of 4 × 103 %, and a fast response time of 21 ms. Gate-tunable photodetectors based on MoTe2/MoS2 heterostructures AAT have potential to realize optoelectronic devices with high performance, providing a novel strategy to achieve high-performance photodetection.
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http://dx.doi.org/10.1088/1361-6528/ada9f3 | DOI Listing |
Nanotechnology
January 2025
Xidian University, Xi'an 710071, China, Xi'an, Xian, Shaanxi, 710126, CHINA.
Anti-ambipolar transistors (AAT) are considered as a breakthrough technology in the field of electronics and optoelectronics, which is not only widely used in diverse logic circuits, but also crucial for the realization of high-performance photodetectors. The anti-ambipolar characteristics arising from the gate-tunable energy band structure can produce high-performance photodetection at different gate voltages. As a result, this places higher demands on the parametric driving range (ΔVg) and peak-to-valley ratio (PVR) of the AAT.
View Article and Find Full Text PDFACS Appl Mater Interfaces
January 2025
Department of Mechanical Engineering, Carnegie Mellon University, Pittsburgh, Pennsylvania 15213, United States.
Small
January 2025
Engineering Research Centre for Micro-Nano Optoelectronic Materials and Devices, Ministry of Education, OSED, Fujian Provincial Key Laboratory of Semiconductor Materials and Applications, Department of Physics, Xiamen University, Xiamen, 361005, P. R. China.
The direct detection of light polarization poses a crucial challenge in the field of optoelectronics and photonics. Herein, the tunable linear dichroism (LD) in GeSe-based polarized photodetectors is presented through electronic and structural asymmetry modulation, and demonstrate their application prospects in wearable electronics. An improvement in the dichroic ratio up to 34% is achieved under a gate voltage of 20 V, and the improvement reaches 44% by applying a tensile strain along the zigzag direction.
View Article and Find Full Text PDFACS Appl Mater Interfaces
September 2024
College of Information Science and Electronic Engineering, Zhejiang University, Hangzhou 310027, China.
Antiambipolar heterojunctions are regarded as a revolutionary technology in the fields of electronics and optoelectronics, enabling the switch between positive and negative transconductance within a single device, which is crucial for diverse logic circuit applications. This study pioneers a mixed-dimensional photodetector featuring antiambipolar properties, facilitated by the van der Waals integration of one-dimensional CdSSe nanowires and two-dimensional Te nanosheets. This antiambipolar device enables flexible control over carrier transport via gate voltage, thus paving new paths for future optoelectronic devices.
View Article and Find Full Text PDFACS Appl Mater Interfaces
August 2024
Center of Excellence for Green Nanotechnologies, Microelectronics and Semiconductor Institute, King Abdulaziz City for Science and Technology, Riyadh 11442, Saudi Arabia.
Recent reports on machine learning and machine vision (MV) devices have demonstrated the potential of two-dimensional (2D) materials and devices. Yet, scalable 2D devices are being challenged by contact resistance and Fermi level pinning (FLP), power consumption, and low-cost CMOS compatible lithography processes. To enable CMOS + 2D, it is essential to find a proper lithography strategy that can fulfill these requirements.
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