In Situ Growth of Metal-Organic Layer on Polyoxometalate-etching CuO to Boost CO Reduction with High Stability.

Angew Chem Int Ed Engl

Institute for New Energy Materials and Low Carbon Technologies, School of Materials Science & Engineering, Tianjin University of Technology, Tianjin, 300384, China.

Published: January 2025

Low-cost CuO with a suitable band gap holds great potential for solar utilization. However severe photocorrosion and weak CO capture capability have significantly hindered their application in artificial photosynthesis. Herein, polyoxometalate (POM)-etching and in situ growth of metal-organic framework (MOF) can simultaneously incorporate electron-sponge and HKUST protective layer into CuO. The resulting ternary composites CuO@POM@HKUST-n (POM=PMoO and PWO) with dual hetero-interfaces can efficiently convert CO to HCOOH with 5226 μmol g yield, over 5 and 55 times higher than that of CuO (1010 μmol g) and CuO@HKUST (95.02 μmol g). In situ XPS and DFT studies reveal that Cu mainly existed in the form of CuO and Cu-MOF, while a unique Cu (1

Download full-text PDF

Source
http://dx.doi.org/10.1002/anie.202423204DOI Listing

Publication Analysis

Top Keywords

situ growth
8
growth metal-organic
8
cuo
5
metal-organic layer
4
layer polyoxometalate-etching
4
polyoxometalate-etching cuo
4
cuo boost
4
boost reduction
4
reduction high
4
high stability
4

Similar Publications

Want AI Summaries of new PubMed Abstracts delivered to your In-box?

Enter search terms and have AI summaries delivered each week - change queries or unsubscribe any time!