We present a SnO gas sensor with an HfO layer that exhibits enhanced performance and reliability for gasistor applications, combining a gas sensor and a memristor. The transparent SnO gasistor with a 30 nm HfO layer demonstrated low forming voltages (7.1 V) and a high response rate of 81.28% to 50 ppm of NO gas, representing an approximately 174.86% increase compared to the response of 29.58% from the SnO gas sensor without the HfO layer. The device also showed improved power efficiency and exceptional long-term stability, with reproducibility tests over 10 days at 10 ppm NO showing a minimal variation of 2.4%. These results indicate that the proposed transparent memristor with the 30 nm HfO layer significantly enhances the device's reliability and effectiveness for gasistor applications.
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http://www.ncbi.nlm.nih.gov/pmc/articles/PMC11678724 | PMC |
http://dx.doi.org/10.3390/mi15121411 | DOI Listing |
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