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Compositionally-graded ferroelectric thin films by solution epitaxy produce excellent dielectric stability. | LitMetric

Compositionally-graded ferroelectric thin films by solution epitaxy produce excellent dielectric stability.

Nat Commun

State Key Laboratory of Silicon and Advanced Semiconductor Materials, School of Materials Science and Engineering, Zhejiang University, Hangzhou, 310027, China.

Published: January 2025

The composition in ferroelectric oxide films is decisive for optimizing properties and device performances. Controlling a composition distribution in these films by a facile approach is thus highly desired. In this work, we report a solution epitaxy of PbZrTiO films with a continuous gradient of Zr concentration, realized by a competitive growth at ~220 °C. These intriguing films demonstrate a frequency-independent of dielectric permittivity below 100 kHz from room-temperature to 280 °C. In particular, the permittivity of the films can be largely regulated from 100 to 50 by slightly varying Zr compositional gradient. These results were revealed to arise from a built-in electric field within the films due to a coupling between the composition gradient and unidirectional spontaneous polarization. Our findings may pave a way to prepare compositionally-graded ferroelectric films by a solution approach, which is promising for practical dielectric, pyroelectric and photoelectric technical applications.

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Source
http://dx.doi.org/10.1038/s41467-024-55411-7DOI Listing
http://www.ncbi.nlm.nih.gov/pmc/articles/PMC11696802PMC

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