Construction of stable Cu/Cu sites at the fullerene/Cu(OH)F interface to boost the electroreduction of CO to C products.

Chem Commun (Camb)

School of Chemistry and Chemical Engineering, Institute of Materials Sciences and Engineering, Institute of Clean Energy and Advanced Nanocatalysis (iClean), Anhui Province Key Laboratory of Coal Clean Conversion and High Valued Utilization, Anhui University of Technology, Maanshan 243002, China.

Published: January 2025

Herein, the reduction of the Cu oxidation state during the CO electro-reduction reaction (CORR) is effectively inhibited by depositing C supramolecular clusters onto the Cu(OH)F surface. By utilizing the unique electronic buffering capacity of C, a significant number of Cu/Cu sites are created, leading to a remarkable faradaic efficiency of C products up to 76.9% and exceptional stability.

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Source
http://dx.doi.org/10.1039/d4cc03987dDOI Listing

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