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Editorial for focus on emerging processes and applications of atomic and molecular layer deposition. | LitMetric

AI Article Synopsis

  • The Focus compiles 10 original research articles and 2 review papers centered on atomic and molecular layer deposition (ALD and MLD).
  • Original research highlights new precursors, processes, and applications, while review papers summarize key advancements in metal ALD surface chemistry and applications in flexible electronics.
  • Overall, the collection aims to deepen understanding of ALD and MLD technologies and encourage further innovation in the field.

Article Abstract

This Focus aims to provide a platform for the latest research progress in atomic and molecular layer deposition (ALD and MLD), which collects 10 original research articles and 2 review papers. The original research articles present new precursors, new processes, and new applications. The review papers give a timely summary on the surface chemistry of metal ALD processes and flexible electronics resulting from ALD and MLD, respectively. This ensemble forms a valuable collection that advances our understanding and knowledge of ALD and MLD, and inspires the continued development of these valuable technologies.

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Source
http://dx.doi.org/10.1088/1361-6528/ad9d4bDOI Listing

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