Deposition of VS/MoSbilayer layers of 2D material on nickel inverse opal structural substrates by SILAR and ECD processes as supercapacitor electrodes.

The composition, microstructure, and electrochemical properties of the two kinds of thin film electrode materials, namely VS/MoS/Ni-IOS and VS/MoS/Ni-foam, were analyzed. The research results indicate that the self-assembled photonic crystal (PhC) templates with adjusted electrophoretic self-assembly processing parameters (100 V cm; 7 min) would lead the specimen to a face-centered closely packed structure. Metallic nickel inverse opal structure (IOS) PhCs whose thickness can be freely regulated simply by electrochemical deposition time. VSand MoSare 2D materials with excellent electrochemical properties. We employed them as the electroactive material in this study and deposited them onto nickel IOS (Ni-IOS) surfaces to form a composite of The specimens exhibited an excellent specific capacitance (2180 F g) at a charge-discharge current density of 5 A g. After the 2000 cycles during the life test, the sample can still retain the original specific capacitance value by 72.3%. The IOS PhC substrate produced in this work is designed as VS/MoS/Ni-IOS supercapacitor electrode materials, which is proved to offer a significant technical contribution to the application of 2D materials in high-performance supercapacitors currently.