The imaging performance of extreme ultraviolet (EUV) lithography is determined by the optical properties and thickness of the photomask absorber material and the illumination source shape. Optimizing the trade-offs between imaging metrics, such as normalized image log slope, telecentricity error, and best focus variation through pitch (collectively known as mask-3-dimensional (M3D) effects), is crucial to improve the throughput of the EUV lithography process. This study aims to optimize Ru/Ta bilayer photomask absorber stacks and illumination source shapes to mitigate M3D effects using mask diffraction analysis. It intends to raise questions about the conventional absorber reflectivity or induced phase shift-based approach.
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