Severity: Warning
Message: file_get_contents(https://...@pubfacts.com&api_key=b8daa3ad693db53b1410957c26c9a51b4908&a=1): Failed to open stream: HTTP request failed! HTTP/1.1 429 Too Many Requests
Filename: helpers/my_audit_helper.php
Line Number: 176
Backtrace:
File: /var/www/html/application/helpers/my_audit_helper.php
Line: 176
Function: file_get_contents
File: /var/www/html/application/helpers/my_audit_helper.php
Line: 250
Function: simplexml_load_file_from_url
File: /var/www/html/application/helpers/my_audit_helper.php
Line: 3122
Function: getPubMedXML
File: /var/www/html/application/controllers/Detail.php
Line: 575
Function: pubMedSearch_Global
File: /var/www/html/application/controllers/Detail.php
Line: 489
Function: pubMedGetRelatedKeyword
File: /var/www/html/index.php
Line: 316
Function: require_once
The exciton effect is commonly observed in photocatalysts, where substantial exciton binding energy ( ) significantly hampers the efficient generation of photo-excited electron-hole pairs, thereby severely constraining photocatalysis. Herein, we propose a strategy to reduce through strain-induced charge delocalization. Taking TaO as a prototype, tensile strain was introduced by engineering a crystalline/amorphous interface, weakening the interaction between Ta 5d and O 2p orbitals, thus endowing a delocalized charge transport and significantly lowering . Consequently, the of strained TaO nanorods (s-TaO NRs) was reduced to 24.26 meV, below the ambient thermal energy (26 meV). The ultralow significantly enhanced the yield of free charges, resulting in a two-fold increase in carrier lifetime and surface potential. Remarkably, the hydrogen evolution rate of s-TaO NRs increased 51.5 times compared to that of commercial TaO. This strategy of strain-induced charge delocalization to significantly reduce offers a promising avenue for developing advanced semiconductor photoconversion systems.
Download full-text PDF |
Source |
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http://www.ncbi.nlm.nih.gov/pmc/articles/PMC11575543 | PMC |
http://dx.doi.org/10.1039/d4sc05873a | DOI Listing |
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