Highly Sensitive Determination of Copper Ions as MnO Etching Inhibitor in Single-Particle Nanoplasmonic Imaging.

Anal Chem

State Key Laboratory of Chemo/Biosensing and Chemometrics, College of Chemistry and Chemical Engineering, Hunan University, Changsha 410082, People's Republic of China.

Published: November 2024

AI Article Synopsis

  • Dark-field microscopy (DFM) using plasmonic metal nanoparticles shows promise for detecting specific targets like Cu by changing the local environment around an Au core through the behavior of a MnO shell.* -
  • The presence of d-penicillamine enhances the etching of MnO, while its chelation with Cu restricts this etching, leading to observable changes in scattered light color.* -
  • This research achieved a reliable Cu detection system with a linear range of 0.1-10 μM and a low detection limit of 4.55 nM, opening doors for future studies on nanoshell etching processes in real-world applications.*

Article Abstract

Dark-field microscopy (DFM) imaging based on plasmonic metal nanoparticles has garnered significant attention. Here, we exploit the susceptibility of MnO to reduction to modulate the local dielectric environment of an Au nanoparticle core through the etching/antietching effects of specific targets on the encapsulated MnO shell. The presence of d-penicillamine promotes MnO etching, while the chelation of d-penicillamine with Cu effectively inhibits this etching. By recording the Cu-induced color shift of scattered light from orange to bright green at the single-particle level and performing the statistical analysis of the green-to-red (G/R) values in DFM images, we achieved quantitative determination of Cu with a wide linear range (0.1-10 μM) and a low limit of detection (4.55 nM). With the facile and reliable Cu assay in real-world samples exemplifying the practicality of the single-particle nanoplasmonic imaging method, this work may inspire future DFM-based investigations of nanoshell etching inhibition processes.

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http://dx.doi.org/10.1021/acs.analchem.4c04691DOI Listing

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  • This research achieved a reliable Cu detection system with a linear range of 0.1-10 μM and a low detection limit of 4.55 nM, opening doors for future studies on nanoshell etching processes in real-world applications.*
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