A rotary vibration-assisted polishing device (RVAPD) is designed to enhance polishing force by converting PZT's linear motion into the rotary motion of a central platform via a flexible mechanism, improving material surface quality. The RVAPD is optimized, simulated, and tested to meet high-frequency and large-amplitude non-resonant vibration polishing requirements. Its structure, designed using theoretical models and finite element software, offers a wide range of polishing parameters. Performance parameters are validated through open-loop tests, confirming effectiveness in polishing experiments. The lever mechanism and Hoeckens connection enhance vibration parameters and motion efficiency, reducing surface flaws in SiC and improving uniformity. Adjusting the RVAPD structure and using the proposed method significantly improve SiC surface quality.
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http://www.ncbi.nlm.nih.gov/pmc/articles/PMC11509902 | PMC |
http://dx.doi.org/10.3390/mi15101242 | DOI Listing |
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