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Comparative clinical evaluation of the stability of implants using double acid etching treatment with and without the addition of fluoride solution: A randomized clinical trial. | LitMetric

Background: Osseointegration depends on primary stability, and further, implant surface modifications may improve secondary stability. This randomized clinical trial evaluates whether adding a fluoride solution enhances the implant stability.

Materials And Methods: Stability of dental implants with two different types of surface treatments was compared utilizing resonance frequency analysis (RFA). Twelve patients were recruited: eight females and four males with an average age of 58.3 years and they received either double acid etched implants (control: Porus Implant, Sistema Conexão) and double acid etched implants containing fluoride on their surfaces (test: Porus Nano Implant, Sistema Conexão). Each patient received one implant from the test category and another implant from the control category, resulting in 24 implants in this study. RFA, utilizing Osstell was used to assess the implant stability, immediately after the placement of implant and 15, 30 and 45 days post-implant placement.

Results: At the initial time, there was no difference between the test and control groups regarding the ISQ. However, after 15, 30, and 45 days, ISQ values for the test group were significantly higher than the control group. When using implants without fluoride addition, it was observed that after 15 days, the ISQ values were lower than those found at the initial time, but after 30 days, values matched the initial. Concerning the test group results, the ISQ values from T0 (immediately after implant placement) to T3 (45 days after implant placement) always increased from every period of evaluation.

Conclusions: It was concluded that double acid etched implants with surfaces containing fluoride solution increases the implant stability quotient, compared to implants with fluoride-free double acid etched surfaces.

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Source
http://www.ncbi.nlm.nih.gov/pmc/articles/PMC11472973PMC
http://dx.doi.org/10.4103/jisp.jisp_52_23DOI Listing

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