AI Article Synopsis

  • - This study explores the properties of a ZnO-based memristor with different top electrode materials (ITO, Ti, Ta), revealing that ITO enables both volatile and nonvolatile switching, along with multistate capabilities.
  • - High-resolution electron microscopy confirmed the polycrystalline structure of the ZnO layer, with the current transport being influenced by Schottky emission, showing a tunable Schottky barrier height based on voltage adjustments.
  • - The memristor effectively simulated synaptic behavior using pulse amplitude modulation and achieved a 90.84% classification accuracy in pattern recognition with a convolutional neural network, indicating its potential for advanced electronic applications.

Article Abstract

This study systematically investigates analog switching and neuromorphic characteristics in a ZnO-based memristor by varying the anodic top electrode (TE) materials [indium tin oxide (ITO), Ti, and Ta]. Compared with the TE materials (Ti and Ta), memristive devices with TEs made of ITO exhibit dual volatile and nonvolatile switching behavior and multistate switching characteristics assessed based on reset-stop voltage and current compliance (ICC) responses. The polycrystalline structure of the ZnO functional layer sandwiched between ITO electrodes was confirmed by high-resolution transmission electron microscopy analysis. The current transport mechanism in the ZnO-based memristor was dominated by Schottky emission, with the Schottky barrier height modulated from 0.26 to 0.4 V by varying the reset-stop voltage under different ICC conditions. The long-term potentiation and long-term depression synaptic characteristics were successfully mimicked by modulating the pulse amplitudes. Furthermore, a 90.84% accuracy was achieved using a convolutional neural network architecture for Modified National Institute of Standards and Technology pattern categorization, as demonstrated by the confusion matrix. The results demonstrated that the ITO/ZnO/ITO/Si memristor device holds promise for high-performance electronic applications and effective ITO electrode modeling.

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http://dx.doi.org/10.1063/5.0233031DOI Listing

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