Potentiostatic and electrochemical impedance spectroscopy (EIS) measurements were recorded to study the nucleation and growth mechanisms of electrodeposited CuNiSnS (CNTS) thin films from aqueous solution at different applied potentials. The electrodeposition process of Cu-Ni-Sn-S precursors were studied using cyclic voltammetry and chronoamperometry techniques. The nucleation and growth mechanism of these films was found to follow a three-dimensional progressive nucleation limited by diffusion-controlled growth. The nucleation mechanism is found to be influenced by the presence of SO , which prompts the electrodeposition of S. electrochemical impedance spectroscopy (EIS) investigates the electrodeposition behavior of CNTS precursors on the surface electrode. A capacitive behavior was observed at high frequencies, while the presence of Warburg diffusion was detected only for potentials less negative than -1.0 V Ag/AgCl. The crystallographic structure, morphology, composition, and optical band gap of CNTS thin films was examined using X-ray diffraction, Raman spectroscopy, scanning electron microscopy, and UV-visible spectroscopy. Electrodeposition at -0.98 V Ag/AgCl resulted in the formation of microsheets with a uniform morphology and homogeneous thickness of sulfurized CNTS film. This potential also proved to be optimal for achieving higher crystallinity, a pure phase, and a suitable band gap energy of approximately 1.6 eV.

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http://www.ncbi.nlm.nih.gov/pmc/articles/PMC11409721PMC
http://dx.doi.org/10.1039/d4ra04249bDOI Listing

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