Ni-P-PTFE cathode with low surface energy for enhancing electrochemical water softening performance.

Water Sci Technol

Department of Chemical Engineering, Dalian University of Technology, No. 2, Linggong Road, Dalian 116024, China; Chambroad Chemical Industry Research Institute Co., Ltd, Economic Development Zone, Boxing Country, Binzhou 256500, China.

Published: August 2024

Efficient cathode regeneration is a significant challenge in the electrochemical water softening process. This work explores the use of an electroless plating Ni-P-PTFE electrode with low surface energy for this purpose. The Ni-P-PTFE electrode demonstrates improved self-cleaning performance at high current densities. By combining the low surface energy of the electrode with fluid flushing shear force, the precipitation rate on the Ni-P-PTFE electrode remains stable at approximately 18 g/m·h over extended periods of operation. Additionally, the cleaning efficiency of the Ni-P-PTFE electrode surpasses that of stainless steel by 66.34%. The Ni-P-PTFE electrode can maintain a larger active area and a longer operational lifespan is attributed to its self-cleaning performance derived from low surface energy. Furthermore, the loose scale layers on the electrode surface are easily removed during electrochemical water softening processes, presenting a novel approach to cathode surface design.

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http://dx.doi.org/10.2166/wst.2024.271DOI Listing

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Ni-P-PTFE cathode with low surface energy for enhancing electrochemical water softening performance.

Water Sci Technol

August 2024

Department of Chemical Engineering, Dalian University of Technology, No. 2, Linggong Road, Dalian 116024, China; Chambroad Chemical Industry Research Institute Co., Ltd, Economic Development Zone, Boxing Country, Binzhou 256500, China.

Efficient cathode regeneration is a significant challenge in the electrochemical water softening process. This work explores the use of an electroless plating Ni-P-PTFE electrode with low surface energy for this purpose. The Ni-P-PTFE electrode demonstrates improved self-cleaning performance at high current densities.

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