Scanning Plasmon-Enhanced Microscopy for Simultaneous Optoelectrical Characterization.

Scanning microscopy methods are crucial for the advancement of nanoelectronics. However, the vertical nanoprobes in such techniques suffer limitations such as the fragility at the tip-sample interface, complex instrumentation, and the lack of in operando functionality in several cases. Here, we introduce scanning plasmon-enhanced microscopy (SPEM) and demonstrate its capabilities on MoS and WSe nanosheets. SPEM combines a nanoparticle-on-mirror (NPoM) configuration with a portable conductive cantilever, enabling simultaneous optical and electrical characterization. This distinguishes it from other current techniques that cannot provide both characterizations simultaneously. It offers a competitive optical resolution of 600 nm with local enhancement of optical signal up to 20,000 times. A single gold nanoparticle with a 15 nm radius forms pristine, nondamaging van der Waals contact, which allows observation of unexpected p-type behavior of MoS at the nanoscale. SPEM reconstructs the NPoM method by eliminating the need for extensive statistical analysis and offering excellent nanoscale mapping resolution of any selected region. It surpasses other scanning techniques in combining precise optical and electrical characterization, interactive simplicity, tip durability, and reproducibility, positioning it as the optimal tool for advancing nanoelectronics.