Enhancing metasurface fabricability through minimum feature size enforcement.

Nanophotonics

Department of Electrical Engineering, The Pennsylvania State University, University Park, PA 16802, USA.

Published: July 2024

The metasurfaces have shown great potential for miniaturizing conventional optics while offering extended flexibility. Recently, there has been considerable interest in using algorithms to generate meta-atom shapes for these metasurfaces, as they offer vast design freedom and not biased by the human intuition. However, these complex designs significantly increase the difficulty of fabrication. To address this, we introduce a design process that rigorously enforces the fabricability of both the material-filled (fill) and empty (void) regions in a metasurface design. This process takes into account specific constraints regarding the minimum feature size for each region. Additionally, it corrects any violations of these constraints across the entire device, ensuring only minimal impact on performance. Our method provides a practical way to create metasurface designs that are easy to fabricate, even with complex shapes, hence improving the overall production yield of these advanced meta-optical components.

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Source
http://www.ncbi.nlm.nih.gov/pmc/articles/PMC11267437PMC
http://dx.doi.org/10.1515/nanoph-2024-0150DOI Listing

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