Enhanced degradation of emerging contaminants by Far-UVC photolysis of peracetic acid: Synergistic effect and mechanisms.

Water Res

College of Environmental and Chemical Engineering, Shanghai Engineering Research Center of Energy, Saving in Heat Exchange Systems, Shanghai University of Electric Power, Shanghai 200090, PR China.

Published: August 2024

AI Article Synopsis

  • Krypton chloride (KrCl*) excimer lamps are effective UV irradiation sources for advanced oxidation processes (UV-AOPs) in water treatment, specifically using the UV/peracetic acid (PAA) process to degrade emerging contaminants in water.
  • The study shows a high degradation rate of carbamazepine (CBZ) at 90.8% in just 45 minutes, significantly outperforming the UV conventional method.
  • Quenching experiments reveal that hydroxyl radicals (HO•) primarily drive the degradation process, while factors like chloride, bicarbonate, and humic acid can hinder effectiveness; the method also shows promise for degrading other contaminants.

Article Abstract

Krypton chloride (KrCl*) excimer lamps (222 nm) are used as a promising irradiation source to drive ultraviolet-based advanced oxidation processes (UV-AOPs) in water treatment. In this study, the UV/peracetic acid (PAA) process is implemented as a novel UV-AOPs for the degradation of emerging contaminants (ECs) in water. The results demonstrate that UV/PAA process exhibits excellent degradation performance for carbamazepine (CBZ), with a removal rate of 90.8 % within 45 min. Notably, the degradation of CBZ in the UV/PAA process (90.8 %) was significantly higher than that in the UV/PAA process (15.1 %) at the same UV dose. The UV/PAA process exhibits superior electrical energy per order (EE/O) performance while reducing resource consumption associated with the high-energy UV/PAA process. Quenching experiments and electron paramagnetic resonance (EPR) detection confirm that HO• play a dominant role in the reaction. The contributions of direct photolysis, HO•, and other active species (RO• and O) are estimated to be 5 %, 88 %, and 7 %, respectively. In addition, the effects of Cl, HCO, and humic acid (HA) on the degradation of CBZ are evaluated. The presence of relatively low concentrations of Cl, HCO, and HA can inhibit CBZ degradation. The UV/PAA oxidation process could also effectively degrade several other ECs (i.e., iohexol, sulfamethoxazole, acetochlor, ibuprofen), indicating the potential application of this process in pollutant removal. These findings will propel the development of the UV/PAA process and provide valuable insights for its application in water treatment.

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http://dx.doi.org/10.1016/j.watres.2024.121943DOI Listing

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