A dual-additive-based aqueous electrolyte was designed with a pH-buffering additive (Zn(OAc)) and an electrostatic shielding additive (TMAOAc) for high Zn plating/stripping efficiency. The buffering pair, OAc/HOAc, can stabilize the pH value to suppress side hydrogen evolution reactions. Meanwhile, TMA acts as a competitive cation being preferentially adsorbed on the uneven surface of the Zn anode and exerts an electrostatic shielding effect to facilitate flat Zn deposition. Such a dual-additive-based electrolyte promotes an ultra-high Zn plating/stripping efficiency of 99.9% at 1 mA cm and long-term cycling stability for 3600 h at 0.5 mA cm, offering valuable insights for advanced aqueous batteries.
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