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Atomic Layer Deposition of TiO on Si Window Enables ATR-SEIRAS Measurements in Strong Alkaline Electrolytes. | LitMetric

Atomic Layer Deposition of TiO on Si Window Enables ATR-SEIRAS Measurements in Strong Alkaline Electrolytes.

Anal Chem

Shanghai Key Laboratory of Molecular Catalysis and Innovative Materials, Collaborative Innovation Center of Chemistry for Energy Materials, Department of Chemistry, Fudan University, Shanghai 200438, China.

Published: June 2024

The Si window is the most widely used internal reflection element (IRE) for electrochemical attenuated total reflection surface-enhanced infrared absorption spectroscopy (ATR-SEIRAS), yet local chemical etching on Si by concentrated OH anions bottlenecks the reliable application of this method in strong alkaline electrolytes. In this report, atomic layer deposition of a 25 nm nonconductive TiO barrier layer on the reflecting plane of a Si prism is demonstrated to address this challenge. ATR-SEIRAS measurement on a Au film electrode with the Si/TiO composite IRE in 1 M NaOH reveals reversible global spectral features without spectral distortion at 1000-1300 cm, in stark contrast to those obtained with a bare Si window. By applying this structured ATR-SEIRAS, ethanol electrooxidation on a Pt/C catalyst in 1 and 5 M NaOH is explored, manifesting that such high pH values prevent the adsorption of as-formed acetate in the C2 pathway but not that of CO intermediate in the C1 pathway.

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Source
http://dx.doi.org/10.1021/acs.analchem.4c01985DOI Listing

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