A see-through augmented reality prototype has been developed based on an ultrathin nanoimprint metalens array, opening up a full-colour, video-rate, and low-cost 3D near-eye display.
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http://dx.doi.org/10.1038/s41377-024-01429-x | DOI Listing |
Recently, nanoimprinting has attracted a new round of attention in the industry due to the boom in demand for augmented reality/virtual reality (AR/VR), metalens and microlens, and even semiconductors. Slanted gratings have great application prospects in AR/VR displays because of their high efficiency in light coupling. UV-Nanoimprint lithography (UV-NIL) has been identified as one of the most feasible routes for mass manufacture of high refractive index (RI) slanted gratings.
View Article and Find Full Text PDFNanoscale Adv
May 2024
King Abdullah University of Science and Technology (KAUST), Advanced Semiconductor Laboratory Thuwal 23955-6900 Saudi Arabia
This work studies the impact of the silicon (Si) loading effect induced by deep reactive ion etching (DRIE) of silicon master molds on the UV-nanoimprint lithography (NIL) patterning of nanofeatures. The silicon molds were patterned with metasurface features with widths varying from 270 to 60 nm. This effect was studied by focus ion beam scanning electron microscopy (FIB-SEM) and atomic force microscopy (AFM).
View Article and Find Full Text PDFLight Sci Appl
May 2024
School of Physics and Astronomy, Monash University, Melbourne, VIC, Australia.
A see-through augmented reality prototype has been developed based on an ultrathin nanoimprint metalens array, opening up a full-colour, video-rate, and low-cost 3D near-eye display.
View Article and Find Full Text PDFNat Mater
April 2023
Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, Republic of Korea.
Metalenses are attractive alternatives to conventional bulky refractive lenses owing to their superior light-modulating performance and sub-micrometre-scale thicknesses; however, limitations in existing fabrication techniques, including high cost, low throughput and small patterning area, have hindered their mass production. Here we demonstrate low-cost and high-throughput mass production of large-aperture visible metalenses using deep-ultraviolet argon fluoride immersion lithography and wafer-scale nanoimprint lithography. Once a 12″ master stamp is imprinted, hundreds of centimetre-scale metalenses can be fabricated using a thinly coated high-index film to enhance light confinement, resulting in a substantial increase in conversion efficiency.
View Article and Find Full Text PDFNanomaterials (Basel)
June 2022
Department of Optics and Photonics, National Central University, Taoyuan 32001, Taiwan.
Flat optics, metasurfaces, metalenses, and related materials promise novel on-demand light modulation within ultrathin layers at wavelength scale, enabling a plethora of next-generation optical devices, also known as metadevices. Metadevices designed with different materials have been proposed and demonstrated for different applications, and the mass production of metadevices is necessary for metadevices to enter the consumer electronics market. However, metadevice manufacturing processes are mainly based on electron beam lithography, which exhibits low productivity and high costs for mass production.
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