Transforming current complementary metal-oxide-semiconductor (CMOS) technology to fabricate memory chips and microprocessors into environmentally friendlier electronics requires the development of new approaches to resource- and energy-efficient electron transport and switching materials. Metal and multi-metal oxide layers play a key role in high-end technical applications. However, these layers are commonly produced through high-energy and high-temperature procedures. Herein, we demonstrate our first attempts to obtain stimuli-responsive mixed-metal oxide thin films from solution-processed molecular precursors under milder conditions. The molecular compounds of interest were prepared by one-pot reactions of a Co carboxylate complex, triethylamine (EtN), -butyldiethanolamine (Hbda), and a hexanuclear complex [CeO(OH)(piv)] (Hpiv = pivalic acid) or [ZrO(OH)(ib)(HO)]·3Hib (Hib = isobutyric acid) in acetonitrile solution. The resulting charge-neutral, heterometallic coordination compounds display a ligand-supported pentanuclear {CeIV3CoIII2} core (in 1) and a dodecanuclear {ZrIV6CoII6} core (in 2), exhibiting thermal stability up to 100 °C in air. Compound 2 was deposited and analyzed on Au(111) and SiO/Si(100) surfaces to explore its potential as a single-molecule precursor for the preparation of atomically precise, complex mixed-metal oxide thin films. The adsorption characteristics of it demonstrate the ability to form stable agglomerates on the investigated surfaces.

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http://dx.doi.org/10.1039/d4dt00328dDOI Listing

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