One possible pathway toward reducing the cost of III-V solar cells is to remove them from their growth substrate by spalling fracture, and then reuse the substrate for the growth of multiple cells. Here we consider the growth of III-V cells on spalled GaAs(100) substrates, which typically have faceted surfaces after spalling. To facilitate the growth of high-quality cells, these faceted surfaces should be smoothed prior to cell growth. In this study, we show that these surfaces can be smoothed during organometallic vapor-phase epitaxy growth, but the choice of epilayer material and modification of the various surfaces by impurities/dopants greatly impacts whether or not the surface becomes smooth, and how rapidly the smoothing occurs. Representative examples are presented along with a discussion of the underlying growth processes. Although this work was motivated by solar cell growth, the methods are generally applicable to the growth of any III-V device on a nonplanar substrate.
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http://dx.doi.org/10.1021/acs.cgd.3c01407 | DOI Listing |
ACS Appl Mater Interfaces
December 2024
National Renewable Energy Laboratory, Golden, Colorado 80401, United States.
The direct epitaxial growth of high-quality III-V semiconductors on Si is a challenging materials science problem with a number of applications in optoelectronic devices, such as solar cells and on-chip lasers. We report the reduction of dislocation density in GaAs solar cells grown directly on nanopatterned V-groove Si substrates by metal-organic vapor-phase epitaxy. Starting from a template of GaP on V-groove Si, we achieved a low threading dislocation density (TDD) of 3 × 10 cm in the GaAs by performing thermal cycle annealing of the GaAs followed by growth of InGaAs dislocation filter layers.
View Article and Find Full Text PDFSmall Methods
December 2024
Institute of Photonics Technologies, National Tsing Hua University, Hsinchu, 30013, Taiwan.
Infrared (IR) emitters have drawn considerable attention for applications in deep-tissue imaging, optical communication, and thermal sensing. While III-V and II-VI semiconductors are traditionally used in these emitters, their reliance on complex epitaxial growth to overcome lattice mismatch and thermal expansion challenges leads to intricate device structures and limits their integrability. In contrast, 2D materials provide a more flexible solution, offering diverse optical bandgaps and the ability to be vertically restacked in arbitrary crystal orientations to form complex van der Waals (vdW) heterostructures, which can be further integrated onto diverse device platforms.
View Article and Find Full Text PDFEarly Hum Dev
January 2025
Division of Neonatology, Children's Hospital of Fudan University, China.
Aims: To assess the maturational status of the brainstem auditory pathway in babies with apnoea of prematurity (AOP) at 33-34 weeks of postmenstrual age (PMA), an important time landmark at which AOP is resolved in most cases.
Study Design: Compare brainstem auditory maturation between very preterm babies with AOP and those without AOP (non-AOP) at the same PMA 33-34 weeks to define differences.
Results: The AOP group showed significantly longer latencies of waves III and V latency than the non-AOP group (p < 0.
Nanomaterials (Basel)
November 2024
Faculty of Physics, St. Petersburg State University, Universitetskaya Emb. 13B, 199034 St. Petersburg, Russia.
Cryst Growth Des
November 2024
EPSRC National Epitaxy Facility, The University of Sheffield, North Campus, Broad Lane, Sheffield S3 7HQ, United Kingdom.
The local droplet etching (LDE) by using indium droplets on bare InP(100) surfaces is demonstrated in a metal-organic vapor phase epitaxy (MOVPE) environment for the first time. The role of an arsenic flow applied to self-assembled metallic indium droplets is systematically studied. Increasing the arsenic supply leads to the formation of ring-like nanostructures and nanoholes.
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