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Topologically Protected Quantum Logic Gates with Valley-Hall Photonic Crystals. | LitMetric

Topologically Protected Quantum Logic Gates with Valley-Hall Photonic Crystals.

Adv Mater

Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurements of Ministry of Education, Beijing Key Laboratory of Nanophotonics and Ultrafine Optoelectronic Systems, School of Physics, Beijing Institute of Technology, Beijing, 100081, China.

Published: June 2024

AI Article Synopsis

  • Topological photonics can enhance the robustness of optical devices, especially against defects and environmental changes.
  • Quantum logic gates are essential for quantum computers and are crucial for advancing quantum information processing.
  • The study demonstrates a topologically protected coupler that can effectively create important quantum gates like control-NOT and Hadamard, offering high fidelity and tolerance to defects, which is a significant step toward practical optical quantum computing.

Article Abstract

Topological photonics provide a promising way to realize more robust optical devices against some defects and environmental perturbations. Quantum logic gates are fundamental units of quantum computers, which are widely used in future quantum information processing. Thus, constructing robust universal quantum logic gates is an important way forward to practical quantum computing. However, the most important problem to be solved is how to construct the quantum-logic-gate-required 2 × 2 beam splitter with topological protection. Here, the experimental realization of the topologically protected contradirectional coupler is reported, which can be employed to realize the quantum logic gates, including control-NOT and Hadamard gates, on the silicon photonic platform. These quantum gates not only have high experimental fidelities but also exhibit a certain degree of tolerances against certain types of defects. This work paves the way for the development of practical optical quantum computations and signal processing.

Download full-text PDF

Source
http://dx.doi.org/10.1002/adma.202311611DOI Listing

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