Additive and lithographic manufacturing technologies using photopolymerisation provide a powerful tool for fabricating multiscale structures, which is especially interesting for biomimetic scaffolds and biointerfaces. However, most resins are tailored to one particular fabrication technology, showing drawbacks for versatile use. Hence, we used a resin based on thiol-ene chemistry, leveraging its numerous advantages such as low oxygen inhibition, minimal shrinkage and high monomer conversion. The resin is tailored to applications in additive and lithographic technologies for future biofabrication where fast curing kinetics in the presence of oxygen are required, namely 3D inkjet printing, digital light processing and nanoimprint lithography. These technologies enable us to fabricate scaffolds over a span of six orders of magnitude with a maximum of 10 mm and a minimum of 150 nm in height, including bioinspired porous structures with controlled architecture, hole-patterned plates and micro/submicro patterned surfaces. Such versatile properties, combined with noncytotoxicity, degradability and the commercial availability of all the components render the resin as a prototyping material for tissue engineers.
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http://www.ncbi.nlm.nih.gov/pmc/articles/PMC10934549 | PMC |
http://dx.doi.org/10.3390/polym16050655 | DOI Listing |
The corner rounding effect in lithography refers to the phenomenon where the corners or angles of a pattern created by lithography are rounded off, rather than remaining square and sharp. This occurs mainly due to the diffraction of light. In addition, mask pattern design, numerical aperture, and the limited resolution of the lithographic process also influence it.
View Article and Find Full Text PDFAdv Manuf
March 2024
Centre of Micro/Nano Manufacturing Technology (MNMT-Dublin), University College Dublin, Dublin 4, Ireland.
This paper presents the design and fabrication of an aluminium oxide cutting insert with an internal cooling channel formed through an additive manufacturing method. The formed insert is subjected to a controlled densification process and analysed through a series of characterisation investigations. The purpose of the study is to develop the design concept and analyse the forming and sintering parameters used in the lithographic ceramic manufacturing process.
View Article and Find Full Text PDFAdv Mater
January 2025
School of Chemistry & Chemical Engineering, Frontiers Science Center for Transformative Molecules, State Key Laboratory for Metal Matrix Composite Materials, Shanghai Jiao Tong University, Shanghai, 200240, China.
Beyond the crystalline photodiodes for infrared visualization, with the limitation of opacity and complex lithographic processes, organic upconversion device (UCD) have emerged as a potential alternative. In this research, a ternary compensation strategy is implemented in a non-fullerene-based active layer to reduce the dark current of the detector and enhance its detection performance, which enables high-sensitive efficient upconversion device for near-infrared light (NIR) visualization. The device achieves an infrared-to-visible upconversion efficiency of 16.
View Article and Find Full Text PDFSensors (Basel)
September 2024
Institute of Natural Sciences and Mathematics, Ural Federal University, 620002 Ekaterinburg, Russia.
Multilayered [Cu(3 nm)/FeNi(100 nm)]/Cu(150 nm)/FeNi(10 nm)/Cu(150 nm)/FeNi(10 nm)/Cu(150 nm)/[Cu(3 nm)/FeNi(100 nm)] structures were obtained by using the magnetron sputtering technique in the external in-plane magnetic field. From these, multilayer magnetoimpedance elements were fabricated in the shape of elongated stripes using the lift-off lithographic process. In order to obtain maximum magnetoimpedance (MI) sensitivity with respect to the external magnetic field, the short side of the rectangular element was oriented along the direction of the technological magnetic field applied during the multilayered structure deposition.
View Article and Find Full Text PDFACS Appl Mater Interfaces
September 2024
Department of Polymer Science and Engineering, Zhejiang University, Hangzhou 310058, China.
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