Additive and lithographic manufacturing technologies using photopolymerisation provide a powerful tool for fabricating multiscale structures, which is especially interesting for biomimetic scaffolds and biointerfaces. However, most resins are tailored to one particular fabrication technology, showing drawbacks for versatile use. Hence, we used a resin based on thiol-ene chemistry, leveraging its numerous advantages such as low oxygen inhibition, minimal shrinkage and high monomer conversion. The resin is tailored to applications in additive and lithographic technologies for future biofabrication where fast curing kinetics in the presence of oxygen are required, namely 3D inkjet printing, digital light processing and nanoimprint lithography. These technologies enable us to fabricate scaffolds over a span of six orders of magnitude with a maximum of 10 mm and a minimum of 150 nm in height, including bioinspired porous structures with controlled architecture, hole-patterned plates and micro/submicro patterned surfaces. Such versatile properties, combined with noncytotoxicity, degradability and the commercial availability of all the components render the resin as a prototyping material for tissue engineers.

Download full-text PDF

Source
http://www.ncbi.nlm.nih.gov/pmc/articles/PMC10934549PMC
http://dx.doi.org/10.3390/polym16050655DOI Listing

Publication Analysis

Top Keywords

additive lithographic
12
lithographic manufacturing
8
manufacturing biomedical
4
biomedical scaffold
4
scaffold structures
4
structures versatile
4
versatile thiol-ene
4
thiol-ene photocurable
4
resin
4
photocurable resin
4

Similar Publications

The corner rounding effect in lithography refers to the phenomenon where the corners or angles of a pattern created by lithography are rounded off, rather than remaining square and sharp. This occurs mainly due to the diffraction of light. In addition, mask pattern design, numerical aperture, and the limited resolution of the lithographic process also influence it.

View Article and Find Full Text PDF

Design and fabrication of an aluminium oxide cutting insert with an internal cooling channel.

Adv Manuf

March 2024

Centre of Micro/Nano Manufacturing Technology (MNMT-Dublin), University College Dublin, Dublin 4, Ireland.

This paper presents the design and fabrication of an aluminium oxide cutting insert with an internal cooling channel formed through an additive manufacturing method. The formed insert is subjected to a controlled densification process and analysed through a series of characterisation investigations. The purpose of the study is to develop the design concept and analyse the forming and sintering parameters used in the lithographic ceramic manufacturing process.

View Article and Find Full Text PDF

Ternary Compensation Enables High-sensitive Efficient Upconversion Device for NIR Visualization.

Adv Mater

January 2025

School of Chemistry & Chemical Engineering, Frontiers Science Center for Transformative Molecules, State Key Laboratory for Metal Matrix Composite Materials, Shanghai Jiao Tong University, Shanghai, 200240, China.

Beyond the crystalline photodiodes for infrared visualization, with the limitation of opacity and complex lithographic processes, organic upconversion device (UCD) have emerged as a potential alternative. In this research, a ternary compensation strategy is implemented in a non-fullerene-based active layer to reduce the dark current of the detector and enhance its detection performance, which enables high-sensitive efficient upconversion device for near-infrared light (NIR) visualization. The device achieves an infrared-to-visible upconversion efficiency of 16.

View Article and Find Full Text PDF

Multilayered [Cu(3 nm)/FeNi(100 nm)]/Cu(150 nm)/FeNi(10 nm)/Cu(150 nm)/FeNi(10 nm)/Cu(150 nm)/[Cu(3 nm)/FeNi(100 nm)] structures were obtained by using the magnetron sputtering technique in the external in-plane magnetic field. From these, multilayer magnetoimpedance elements were fabricated in the shape of elongated stripes using the lift-off lithographic process. In order to obtain maximum magnetoimpedance (MI) sensitivity with respect to the external magnetic field, the short side of the rectangular element was oriented along the direction of the technological magnetic field applied during the multilayered structure deposition.

View Article and Find Full Text PDF

Influence of Chemical Structures on E-Beam Lithography Performance of Polysilsesquioxanes.

ACS Appl Mater Interfaces

September 2024

Department of Polymer Science and Engineering, Zhejiang University, Hangzhou 310058, China.

Article Synopsis
  • Hydrogenated silsesquioxane (HSQ) is a well-known electron beam resist known for its high resolution and etching resistance but struggles with stability and sensitivity.
  • Our study evaluated three types of functionalized polysilsesquioxane (PSQ) resists—olefins, halogenated alkanes, and alkanes—finding that adding olefin groups significantly increased sensitivity and resolution in electron beam lithography.
  • We uncovered the lithographic reaction mechanism, providing insights into how molecular structure affects performance, paving the way for future developments in electron beam resists for microelectronics.
View Article and Find Full Text PDF

Want AI Summaries of new PubMed Abstracts delivered to your In-box?

Enter search terms and have AI summaries delivered each week - change queries or unsubscribe any time!