AI Article Synopsis

  • - The emergence of gate all around field effect transistors (GAAFETs) offers improved performance by effectively controlling second-order effects as traditional transistors reach their limits in miniaturization.
  • - Traditional methods for analyzing device characteristics are slow and inefficient, prompting the exploration of deep learning (DL) and machine learning (ML) to enhance this process.
  • - An integrated learning model combining DL and ML has been developed, achieving highly accurate predictions for GAAFET electrical characteristics, thereby facilitating faster device and circuit simulation in microelectronics.

Article Abstract

As device feature sizes continue to decrease and fin field effect transistors reach their physical limits, gate all around field effect transistors (GAAFETs) have emerged with larger gate control areas and stackable characteristics for better suppression of second-order effects such as short-channel effects due to their gate encircling characteristics. Traditional methods for studying the electrical characteristics of devices are mostly based on the technology computer-aided design. Still, it is not conducive to developing new devices due to its time-consuming and inefficient drawbacks. Deep learning (DL) and machine learning (ML) have been well-used in recent years in many fields. In this paper, we propose an integrated learning model that integrates the advantages of DL and ML to solve many problems in traditional methods. This integrated learning model predicts the direct current characteristics, capacitance characteristics, and electrical parameters of GAAFET better than those predicted by DL or ML methods alone, with a linear regression factor () greater than 0.99 and very small root mean square error. The proposed integrated learning model achieves fast and accurate prediction of GAAFET electrical characteristics, which provides a new idea for device and circuit simulation and characteristics prediction in microelectronics.

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Source
http://dx.doi.org/10.1088/1361-6528/ad2c52DOI Listing

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