In this study, a systematic investigation of MoS nanostructure growth on a SiO substrate was conducted using a two-stage process. Initially, a thin layer of Mo was grown through sputtering, followed by a sulfurization process employing the CVD technique. This two-stage process enables the control of diverse nanostructure formations of both MoS and MoO on SiO substrates, as well as the formation of bulk-like grain structures. Subsequently, the addition of reduced graphene oxide (rGO) was examined, resulting in MoS/rGO(n), where graphene is uniformly deposited on the surface, exposing a higher number of active sites at the edges and consequently enhancing electroactivity in the HER. The influence of the synthesis time on the treated MoS and also MoS/rGO(n) samples is evident in their excellent electrocatalytic performance with a low overpotential.
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http://www.ncbi.nlm.nih.gov/pmc/articles/PMC10819749 | PMC |
http://dx.doi.org/10.3390/molecules29020523 | DOI Listing |
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