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Properties of AlGaAs grown from a mixed Ga-Bi melt. | LitMetric
Thick smoothly graded AlGaAs layers (50-100 µm) are used in light-emitting diode structures and also for creation of high-power photovoltaic converters with side-input of laser radiation. To achieve the required thickness of the AlGaAs layer the high temperature LPE growth technique is required. However high epitaxial temperature increases the unintentional doping level. Epitaxy from mixed Ga-Bi melts was investigated as a way to solve this problem. It was found that for growing relatively thick AlGaAs layers, it is expedient to use Ga-Bi melts with 20 at% or less bismuth content. SIMS and Hall characterization of AlGaAs layers revealed that the growth of AlGaAs from mixed Ga-Bi melts reduces the background doping level (including carbon) and influences the native defect formation keeping the n-type conductivity. This effect is explained by the changes of the group III and V elements concentrations in the melt as well as Bi incorporation in the lattice.
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