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Influence of Different Pt Functionalization Modes on the Properties of CuO Gas-Sensing Materials. | LitMetric

AI Article Synopsis

  • * Two methods of functionalization were compared: Pt-doping of CuO versus Pt-loading onto CuO, revealing that each method significantly improves the sensor’s response to NO gas at low temperatures.
  • * Results showed that Pt-loaded CuO performed better at 25 °C, while Pt-doped CuO had a greater response with rising temperatures; the differences in performance were linked to varying mechanisms of electron and chemical sensitization related to how Pt was applied.

Article Abstract

The functionalization of noble metals is an effective approach to lowering the sensing temperature and improving the sensitivity of metal oxide semiconductor (MOS)-based gas sensors. However, there is a dearth of comparative analyses regarding the differences in sensitization mechanisms between the two functionalization modes of noble metal loading and doping. In this investigation, we synthesized Pt-doped CuO gas-sensing materials using a one-pot hydrothermal method. And for Pt-loaded CuO, Pt was deposited on the synthesized pristine CuO surface by using a dipping method. We found that both functionalization methods can considerably enhance the response and selectivity of CuO toward NO at low temperatures. However, we observed that CuO with Pt loading had superior sensing performance at 25 °C, while CuO with Pt doping showed more substantial response changes with an increase in the operating temperature. This is mainly due to the different dominant roles of electron sensitization and chemical sensitization resulting from the different forms of Pt present in different functionalization modes. For Pt doping, electron sensitization is stronger, and for Pt loading, chemical sensitization is stronger. The results of this study present innovative ideas for understanding the optimization of noble metal functionalization for the gas-sensing performance of metal oxide semiconductors.

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Source
http://www.ncbi.nlm.nih.gov/pmc/articles/PMC10780899PMC
http://dx.doi.org/10.3390/s24010120DOI Listing

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