AI Article Synopsis

  • A new method is introduced to measure the extinction coefficient (k) of transparent film materials without needing complex optical models or extra physical property data.
  • The approach involves creating a sample with two areas (one coated with the film and the other possibly uncoated or with a different film thickness) to evaluate the differential transmittance under specific conditions, including light polarized at the Brewster angle.
  • Proportionality between differential transmittance and k depends on the film thickness, wavelength, and Brewster angle, and is demonstrated using the example of calculating k for AlF films, with uncertainties analyzed to ensure accuracy.

Article Abstract

A new procedure to measure the extinction coefficient k of film materials that are relatively transparent is presented. This procedure does not require the use of an optical-constant model or the knowledge of extra physical properties of the material, such as the specific heat capacity. It involves preparing a sample with two areas, at least one of them coated with the film, whereas the other may remain uncoated or may be coated with a different thickness of the same material. The differential transmittance between the two sample areas is shown to be proportional to k of the film material in the following measurement conditions: the incident light is p polarized and it impinges at the film material Brewster angle. The differential transmittance is obtained with a single measurement by making the light beam or the sample to oscillate with respect to one another and by using a lock-in amplifier; for normalization purposes, the transmittance in one of the sample areas is also measured. The proportionality factor between the normalized differential transmittance and k only involves the wavelength, the film thickness, and the Brewster angle. The knowledge of the film Brewster angle requires that the film refractive index (n) is measured beforehand; this can be performed with standard procedures, such as ellipsometry, since such techniques are efficient at measuring n of a transparent material, but are inefficient at measuring a small k. The procedure is exemplified with the calculation of k in the far ultraviolet of AlF films deposited by evaporation. The dependence of the uncertainty of k obtained with this procedure is analyzed in terms of the uncertainty of the film n, of wavelength, and of the degree of polarization of the incident beam. The selection of a substrate with similar n to the film material is also discussed. The uncertainties involved with the present procedure were analyzed for a specific example and an uncertainty of 2 × 10 in k calculation is considered feasible.

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Source
http://dx.doi.org/10.1364/OE.496241DOI Listing

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