Growth and characterization of germanium telluride nanowires via vapor-liquid-solid mechanism.

Phase-change materials (PCMs), which can transition reversibly between crystalline and amorphous phases, have shown great promise for next-generation memory devices due to their nonvolatility, rapid switching periods, and random-access capability. Several groups have investigated phase-change nanowires for memory applications in recent years. The ability to regulate the scale of nanostructures remains one of the most significant obstacles in nanoscience. Herein, we describe the growth and characterization of germanium telluride (GeTe) nanowires, which are essential for phase-change memory devices. GeTe nanowires were produced by combining thermal evaporation and vapor-liquid-solid (VLS) techniques, using 8 nm Au nanoparticles as the metal catalyst. The influence of various growth parameters, including inert gas flow rate, working pressure, growth temperature, growth duration, and growth substrate, was examined. Ar gas flow rate of 30 sccm and working pressure of 75 Torr produced the narrowest GeTe nanowires horizontally grown on a Si substrate. Using scanning electron microscopy, the dimensions, and morphology of GeTe nanowires were analyzed. Transmission electron microscopy and energy-dispersive x-ray spectroscopy were utilized to conduct structural and chemical analyses. Using a SiO/Si substrate produced GeTe nanowires that were thicker and lengthier. The current-voltage characteristics of GeTe nanowires were investigated, confirming the amorphous nature of GeTe nanowires using conductive atomic force microscopy. In addition, the effects of the VLS mechanism and the Gibbs-Thomson effect were analyzed, which enables the optimization of nanowires for numerous applications, such as memory and reservoir computing.