In this work, a simple catalyst-free physical vapor deposition method is optimized by adjusting source material pressure and evaporation time for the reliable obtaining of freestanding nanoribbons with thicknesses below 15 nm. The optimum synthesis temperature, time and pressure were determined for an increased yield of ultrathin BiSe nanoribbons with thicknesses of 8-15 nm. Physical and electrical characterization of the synthesized BiSe nanoribbons with thicknesses below 15 nm revealed no degradation of properties of the nanoribbons, as well as the absence of the contribution of trivial bulk charge carriers to the total conductance of the nanoribbons.

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http://www.ncbi.nlm.nih.gov/pmc/articles/PMC10489768PMC
http://dx.doi.org/10.3390/nano13172484DOI Listing

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