https://eutils.ncbi.nlm.nih.gov/entrez/eutils/efetch.fcgi?db=pubmed&id=37682978&retmode=xml&tool=Litmetric&email=readroberts32@gmail.com&api_key=61f08fa0b96a73de8c900d749fcb997acc09 3768297820231003
1944-825215372023Sep20ACS applied materials & interfacesACS Appl Mater InterfacesAmbient Processed rGO/Ti3CNTx MXene Thin Film with High Oxidation Stability, Photosensitivity, and Self-Cleaning Potential.440754408644075-4408610.1021/acsami.3c07972Solution-based processing offers advantages for producing thin films due to scalability, low cost, simplicity, and benignity to the environment. Here, we develop conductive and photoactivated self-cleaning reduced graphene oxide (rGO)/Ti3CNTx MXene thin films via spin coating under ambient conditions. The addition of a thin rGO layer on top of Ti3CNTx resulted in up to 45-fold improvement in the environmental stability of the film compared to the bare Ti3CNTx film. The optimized rGO/Ti3CNTx thin film exhibits an optical transmittance of 74% in the visible region of the spectrum and a sheet resistance of 19 kΩ/sq. The rGO/Ti3CNTx films show high rhodamine B discoloration activity upon light irradiation. Under UV irradiation, the electrically conductive MXene in combination with in situ formed semiconducting titanium oxide induces photogenerated charge carriers, which could potentially be used in photocatalysis. On the other hand, due to film transparency, white light irradiation can bleach the adsorbed dye via photolysis. This study opens the door for using MXene thin films as multifunctional coatings with conductive and potentially self-cleaning properties.PurbayantoMuhammad Abiyyu KenichiMAK0000-0002-0271-220XFaculty of Materials Science and Engineering, Warsaw University of Technology, Wołoska 141, Warsaw 02-507, Poland.BuryDominikaDFaculty of Materials Science and Engineering, Warsaw University of Technology, Wołoska 141, Warsaw 02-507, Poland.ChandelMadhuryaMFaculty of Materials Science and Engineering, Warsaw University of Technology, Wołoska 141, Warsaw 02-507, Poland.ShahrakZhila DehghanZDDepartment of Chemistry, Missouri University of Science and Technology, Rolla, Missouri 65409 United States.MochalinVadym NVN0000-0001-7403-1043Department of Chemistry, Missouri University of Science and Technology, Rolla, Missouri 65409 United States.Department of Materials Science and Engineering, Missouri University of Science and Technology, Rolla, Missouri 65409 United States.WójcikAnnaAPolish Academy of Sciences, Institute of Metallurgy and Materials Science, W. Reymonta 25, 30-059 Cracow, Poland.MoszczyńskaDorotaDFaculty of Materials Science and Engineering, Warsaw University of Technology, Wołoska 141, Warsaw 02-507, Poland.WojciechowskaAnitaA0000-0003-3207-1359Faculty of Materials Science and Engineering, Warsaw University of Technology, Wołoska 141, Warsaw 02-507, Poland.TabassumAnikaADepartment of Physics and Engineering Physics, Tulane University, New Orleans, Louisiana 70118, United States.NaguibMichaelM0000-0002-4952-9023Department of Physics and Engineering Physics, Tulane University, New Orleans, Louisiana 70118, United States.JastrzębskaAgnieszka MariaAMFaculty of Materials Science and Engineering, Warsaw University of Technology, Wołoska 141, Warsaw 02-507, Poland.engJournal Article20230908
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