Effect of growth temperature on self-rectifying BaTiO/ZnO heterojunction for high-density crossbar arrays and neuromorphic computing.

J Colloid Interface Sci

Department of Electrical Engineering, Sejong University, Seoul 05006, Republic of Korea; Department of Convergence Engineering for Intelligent Drone, Sejong University, Seoul 05006, Republic of Korea; Department of Semiconductor Systems Engineering, Sejong University, Seoul 05006, Republic of Korea. Electronic address:

Published: December 2023

In the quest for high-density integration and massive scalability, ferroelectric-based devices provide an achievable approach for nonvolatile crossbar array (CBA) architecture and neuromorphic computing. In this report, ferroelectric-semiconductor (Pt/BaTiO/ZnO/Au) heterojunction-based devices are demonstrated to exhibit nonvolatile and synaptic characteristics. In this study, the ferroelectric (BaTiO) layer was modulated at various growth temperatures of 350 °C, 450 °C, 550 °C and 650 °C. Growing temperature in the ferroelectric layer has a significant impact on resistive switching. The ferroelectricity of the BaTiO thin film enhanced by increasing temperature causes a substantial shift in the interface state density at heterojunction interface, which is crucial for self-rectification. Furthermore, this self-rectifying property advances to reduce the crosstalk problem without any selector device. Enhanced resistive switching and neuromorphic applications have been demonstrated using BaTiO heterostructure devices at 550 °C. The dynamic ferroelectric polarization switching in this heterojunction demonstrated linear conductance change in artificial synapses with 91 % recognition accuracy. Ferroelectric polarization reversal with a depletion region at the heterojunction interface is the responsible mechanism for the switching in these devices. Thus, these findings pave the way for designing low power high-density crossbar arrays and neuromorphic application based on ferroelectric-semiconductor heterostructures.

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http://dx.doi.org/10.1016/j.jcis.2023.08.105DOI Listing

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