Optical Printing of Silicon Nanoparticles as Strain-Driven Nanopixels.

ACS Appl Mater Interfaces

Guangdong Provincial Key Laboratory of Nanophotonic Manipulation, Institute of Nanophotonics, Jinan University, Guangzhou 511443, China.

Published: August 2023

Silicon nanoparticles (Si NPs) supporting Mie resonances exhibit vivid structural colors on the subwavelength scale. For future wearable devices, next generation Si-based optical units need to be dynamic and stretchable for display, sensing, or signal processing required by human-computer interaction. Here, by utilizing the distance-sensitive electromagnetic coupling of Mie resonances, we maximize the active tuning effect of Si NP-based structures including dimers, oligomers, and NPs on WS, which we called Si nanopixels. Through the optical tweezers-assisted printing of Si nanopixels, patterns can be formed on arbitrary flexible substrates. The strain-sensitive tuning of scattering spectra indicates their promising application on strain sensing of various stretchable substrates via a simple "spray and test" process. In the case of Si nanopixels on polydimethylsiloxane (PDMS), local strains around 1% can be detected by a scattering measurement. Moreover, we demonstrate that the scattering intensity variation of Si nanopixels printed on wrinkled tungsten disulfide (WS) is pixel-dependent and wavelength-dependent. This property facilitates the application of information encryption, and we demonstrate that three barcodes can be independently encoded into the R, G, and B scattering channels through ternary logic represented by the strain-tuning effects of scattering.

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Source
http://dx.doi.org/10.1021/acsami.3c06391DOI Listing

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