Gate-all-around (GAA) structures are important for future logic devices and 3D-DRAM. Inner-spacer cavity etching and channel release both require selective etching of SiGe. Increasing the number of channel-stacking layers is an effective way to improve device current-driving capability and storage density. Previous work investigated ICP selective etching of a three-cycle SiGe/Si multilayer structure and the related etching effects. This study focuses on the dry etching of a 15-cycle SiGe/Si multilayer structure and the associated etching effects, using simulation and experimentation. The simulation predicts the random effect of lateral etching depth and the asymmetric effect of silicon nanosheet damage on the edge, both of which are verified by experiments. Furthermore, the study experimentally investigates the influence and mechanism of pressure, power, and other parameters on the etching results. Research on these etching effects and mechanisms will provide important points of reference for the dry selective etching of SiGe in GAA structures.
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http://dx.doi.org/10.3390/nano13142127 | DOI Listing |
J Prosthet Dent
December 2024
Assistant Professor, State Key Laboratory of Oral & Maxillofacial Reconstruction and Regeneration, National Clinical Research Center for Oral Diseases, Shaanxi Key Laboratory of Stomatology, Department of Prosthodontics,School of Stomatology, The Fourth Military Medical University, Xi'an, Shaanxi, PR China. Electronic address:
Statement Of Problem: Polyetheretherketone (PEEK) has been used in clinical dentistry because of its excellent physical and biological properties. However, achieving an effective and durable bond with enamel is challenging because of its chemical inertness and low surface energy, and data on the effects of different surface treatments on the durability of PEEK-enamel bonds are scarce.
Purpose: The purpose of this in vitro study was to investigate airborne-particle abrasion, sulfuric acid etching, and the combined use of these treatments on the bonding durability of PEEK-enamel bonds and to gain a deeper understanding of their bonding mechanism.
ACS Appl Mater Interfaces
December 2024
Department of Materials Science and Engineering, Seoul National University, Seoul 08826, Republic of Korea.
Achieving precise and cost-effective etching in the field of silicon three-dimensional (3D) structure fabrication remains a significant challenge. Here, we present the successful fabrication of microscale anisotropic Si structures with an etching anisotropy of 0.73 using Cu-metal-assisted chemical etching (Cu-MACE) and propose a mechanism to elucidate the chemical behavior of Cu within the MACE solution.
View Article and Find Full Text PDFBMC Oral Health
December 2024
Dental Sciences Research Center, Department of Prosthodontics, School of Dentistry, Guilan University of Medical Sciences, Rasht, Iran.
Int J Periodontics Restorative Dent
December 2024
Purpose: This study is designed to explore the effect of Er,Cr:YSGG laser tooth etching versus that of conventional tooth surface treatment on the shear bond strength of ceramic laminate veneers.
Methods: Seventy-six maxillary premolars were assigned to two groups (n = 38) according to the type of enamel surface treatment approach. Group 1: samples treated with the conventional acid-etch protocol.
ACS Appl Mater Interfaces
December 2024
Faculty of Physics, Lomonosov Moscow State University, Leninskie Gory 1, 119991 Moscow, Russian Federation.
This study investigates the use of photoluminescent amphiphilic porous silicon nanoparticles (αϕ-pSiNPs) as effective ultrasound (US) amplifiers for cancer sonodynamic theranostics. αϕ-pSiNPs were synthesized via a novel top-down approach involving porous silicon (pSi) films electrochemical etching, borate oxidation, and hydrophobic coating with octadecylsilane (C18), resulting in milling into nanoparticles with hydrophilic exteriors and hydrophobic interiors. These properties promote gas trapping and cavitation nucleation, significantly lowering the US cavitation threshold and resulting in selective destruction of cancer cells in the presence of nanoparticles.
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