The extraordinary mechanical properties of two-dimensional transition-metal dichalcogenides make them ideal candidates for investigating strain-induced control of various physical properties. Here we explore the role of nonuniform strain in modulating optical, electronic, and transport properties of semiconducting, chemical vapor deposited monolayer MoS, on periodically nanostructured substrates. A combination of spatially resolved spectroscopic and electronic properties explore and quantify the differential strain distribution and carrier density on a monolayer, as it conformally drapes over the periodic nanostructures. The observed accumulation in electron density at the strained regions is supported by theoretical calculations which form the likely basis for the ensuing ×60 increase in field effect mobility in strained samples. Though spatially nonuniform, the pattern-induced strain is shown to be readily controlled by changing the periodicity of the nanostructures thus providing a robust yet useful macroscopic control on strain and mobility in these systems.
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http://dx.doi.org/10.1021/acs.nanolett.3c01774 | DOI Listing |
J Am Chem Soc
January 2025
State Key Laboratory of Molecular Reaction Dynamics, Dalian Institute of Chemical Physics, Chinese Academy of Sciences, Dalian 116023, China.
Monolayer MoS is an effective electrocatalyst for the hydrogen evolution reaction (HER). Despite significant efforts to optimize the active sites, its catalytic performance still falls short of theoretical predictions. One key factor that has often been overlooked is the electron injection from the conductive substrate into the MoS.
View Article and Find Full Text PDFACS Nano
January 2025
Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei 106319, Taiwan.
Edge contacts offer a significant advantage for enhancing the performance of semiconducting transition metal dichalcogenide (TMDC) devices by interfacing with the metallic contacts on the lateral side, which allows the encapsulation of all of the channel material. However, despite intense research, the fabrication of feasible electrical edge contacts to TMDCs to improve device performance remains a great challenge, as interfacial chemical characterization via conventional methods is lacking. A major bottleneck in explicitly understanding the chemical and electronic properties of the edge contact at the metal-two-dimensional (2D) semiconductor interface is the small cross section when characterizing nominally one-dimensional edge contacts.
View Article and Find Full Text PDFACS Appl Mater Interfaces
January 2025
Department of Physics, School of Physical Science and Engineering, Beijing Jiaotong University, Beijing 100044, China.
Two-dimensional (2D) materials with spontaneous polarization can exhibit large second-order nonlinear optical (NLO) effects. Here, we present a series of stable distorted monolayers by using first-principles calculations and lattice vibration analysis. The structural distortion leads to a lower polar symmetry, giving rise to intrinsic ferroelectricity with a Curie point up to room temperature.
View Article and Find Full Text PDFNanoscale
January 2025
Department of Condensed Matter and Materials Physics, S. N. Bose National Centre for Basic Sciences, Block JD, Sector III, Salt Lake, Kolkata-700106, India.
Herein, we investigated the carrier-phonon relaxation process in a two-dimensional (2D) BAPbBr perovskite and its heterostructure with MoS. Energy transfer was observed in the van der Waals heterostructure of 2D perovskite and monolayer MoS, leading to enhancement in the photoluminescence intensity of MoS. Femtosecond pump-probe spectroscopy was used to study the carrier and lattice dynamics of pristine 2D materials and their heterostructure.
View Article and Find Full Text PDFResearch (Wash D C)
January 2025
School of Integrated Circuits and Beijing Advanced Innovation Center for Integrated Circuits, Peking University, Beijing 100871, China.
Edge contact is essential for achieving the ultimate device pitch scaling of stacked nanosheet transistors with monolayer 2-dimensional (2D) channels. However, due to large edge-contact resistance between 2D channels and contact metal, there is currently a lack of high-performance edge-contact device technology for 2D material channels. Here, we report high-performance edge-contact monolayer molybdenum disulfide (MoS) field-effect transistors (FETs) utilizing well-controlled plasma etching techniques.
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