Perovskite solar cells (PSCs) based on the SnO electron transport layer (ETL) have achieved remarkable photovoltaic efficiency. However, the commercial SnO ETLs show various shortcomings. The SnO precursor is prone to agglomeration, resulting in poor morphology with numerous interface defects. Additionally, the open circuit voltage (V ) would be constrained by the energy level mismatch between the SnO and the perovskite. And, few studies designed SnO -based ETLs to promote crystal growth of PbI , a crucial prerequisite for obtaining high-quality perovskite films via the two-step method. Herein, we proposed a novel bilayer SnO structure that combined the atomic layer deposition (ALD) and sol-gel solution to well address the aforementioned issues. Due to the unique conformal effect of ALD-SnO , it can effectively modulate the roughness of FTO substrate, enhance the quality of ETL, and induce the growth of PbI crystal phase to develop the crystallinity of perovskite layer. Furthermore, a created built-in field of the bilayer SnO can help to overcome the electron accumulation at the ETL/perovskite interface, leading to a higher V and fill factor. Consequently, the efficiency of PSCs with ionic liquid solvent increases from 22.09% to 23.86%, maintaining 85% initial efficiency in a 20% humidity N2 environment for 1300 h.
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http://dx.doi.org/10.1002/smll.202303254 | DOI Listing |
Small
December 2024
Department of Materials Science and Engineering, Seoul National University of Science and Technology, Seoul, 01811, Republic of Korea.
In fabricating high-efficiency all-perovskite tandem solar cells (APTSCs) with a p-i-n configuration, the electron transport layer (ETL) plays a critical role in facilitating the transport of photogenerated electrons from the front cell to the recombination layer and protecting the front cell from damage during rear cell fabrication. This study introduces aluminum-doped InO (AIO) films grown by atomic layer deposition (ALD) as a promising ETL for high-efficiency APTSCs. ALD-grown AIO films with an optimized Al concentration exhibit superior charge transport characteristics, excellent transparency, and damage-resistant barrier properties against solution infiltration compared with conventional SnO ETLs and undoped ALD InO.
View Article and Find Full Text PDFSmall
November 2024
Yunnan Key Laboratory of Electromagnetic Materials and Devices, National Center for International Research on Photoelectric and Energy Materials, School of Materials and Energy, Yunnan University, Kunming, 650091, P. R. China.
In order to enhance the overall efficiency of colloidal quantum dots solar cells, it is crucial to suppress the recombination of charge carriers and minimize energy loss at the interfaces between the transparent electrode, electron transport layer (ETL), and colloidal quantum dots (CQDs) light-absorbing material. In the current study, ZnO/SrTiO (STO), ZnO/WO (TO), and ZnO/ZnSnO (ZTO) bilayers are introduced as an ETL using a spin-coating technique. The ZTO interlayer exhibits a smoother surface with a root-mean-square (RMS) value of ≈ 3.
View Article and Find Full Text PDFAdv Mater
October 2024
Australian Centre for Advanced Photovoltaics (ACAP), School of Photovoltaic and Renewable Energy Engineering, University of New South Wales, Sydney, NSW, 2052, Australia.
J Am Chem Soc
July 2024
Key Laboratory of Photoelectric Conversion and Utilization of Solar Energy, Qingdao Institute of Bioenergy and Bioprocess Technology, Chinese Academy of Sciences, Qingdao 266101, P.R. China.
Previous findings have suggested a close association between oxygen vacancies in SnO and charge carrier recombination as well as perovskite decomposition at the perovskite/SnO interface. Underlying the fundamental mechanism holds great significance in achieving a more favorable balance between the efficiency and stability. In this study, we prepared three SnO samples with different oxygen vacancy concentrations and observed that a low oxygen vacancy concentration is conducive to long-term device stability.
View Article and Find Full Text PDFNano Lett
April 2024
School of Chemical Engineering, Center for Antibonding Regulated Crystals, Sungkyunkwan University, Suwon 16419, Republic of Korea.
Halide perovskite-based resistive switching memory (memristor) has potential in an artificial synapse. However, an abrupt switch behavior observed for a formamidinium lead triiodide (FAPbI)-based memristor is undesirable for an artificial synapse. Here, we report on the δ-FAPbI/atomic-layer-deposited (ALD)-SnO bilayer memristor for gradual analogue resistive switching.
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