We develop a method to fabricate an undoped Ge quantum well (QW) under a 32 nm relaxed SiGe shallow barrier. The bottom barrier contains SiGe (650 °C) and SiGe (800 °C) such that variation of Ge content forms a sharp interface that can suppress the threading dislocation density (TDD) penetrating into the undoped Ge quantum well. The SiGe barrier introduces enough in-plane parallel strain (ε strain -0.41%) in the Ge quantum well. The heterostructure field-effect transistors with a shallow buried channel obtain an ultrahigh two-dimensional hole gas (2DHG) mobility over 2 × 10 cm/(V s) and a very low percolation density of (5.689 ± 0.062) × 10 cm. The fractional indication is also observed at high density and high magnetic fields. This strained germanium as a noise mitigation material provides a platform for integration of quantum computation with a long coherence time and fast all-electrical manipulation.
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